Understanding and controlling nucleation and growth of TiO2 deposited on multiwalled carbon nanotubes by atomic layer deposition

Journal of Physical Chemistry C

Volumn 119, Issue 6, 2015, Pages 3379-3387

  Zhang, Yucheng ^a   Guerra Nuñez, Carlos ^a   Utke, Ivo ^a   Michler, Johann ^a   Rossell, Marta D ^a   Erni, Rolf ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMS; CARBON FILMS; CRYSTALLINITY; CRYSTALLIZATION; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; MORPHOLOGY; MULTIWALLED CARBON NANOTUBES (MWCN); NANOCRYSTALLINE MATERIALS; NANOTUBES; NUCLEATION; OXIDE FILMS; OXIDE MINERALS; SOLAR ENERGY; TITANIUM DIOXIDE;

ABERRATION-CORRECTED; ATOMIC RESOLUTION; CONTROLLED DEPOSITION; DEPOSITION CONDITIONS; DEPOSITION TEMPERATURES; DIRECT OBSERVATIONS; NUCLEATION AND GROWTH; SURFACE PRETREATMENT;

ATOMIC LAYER DEPOSITION;

EID: 84923197129     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp511004h     Document Type: Article

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