Pseudocapacitance of amorphous TiO2 thin films anchored to graphene and carbon nanotubes using atomic layer deposition

Journal of Physical Chemistry C

Volumn 117, Issue 44, 2013, Pages 22497-22508

  Sun, Xiang ^a   Xie, Ming ^b   Travis, Jonathan J ^b   Wang, Gongkai ^a   Sun, Hongtao ^a   Lian, Jie ^a   George, Steven M ^b  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b UNIVERSITY OF COLORADO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DOUBLE LAYER CAPACITANCE; ELECTRICAL CONDUCTIVITY; ELECTROCHEMICAL CHARACTERISTICS; GALVANOSTATIC CHARGE/DISCHARGE; HIGH SPECIFIC CAPACITANCES; IONIC DIFFUSIVITIES; POSITIVE ELECTRODES; SPECIFIC CAPACITANCE;

COATED WIRE ELECTRODES; CYCLIC VOLTAMMETRY; DEPOSITION; ELECTROCHEMICAL IMPEDANCE SPECTROSCOPY; ELECTRODES; ELECTROLYTES; GRAPHENE; MULTIWALLED CARBON NANOTUBES (MWCN); TITANIUM DIOXIDE; ULTRATHIN FILMS;

ATOMIC LAYER DEPOSITION;

EID: 84889855210     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp4066955     Document Type: Article

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