Equilibrium chemical vapor deposition growth of bernal-stacked bilayer graphene

ACS Nano

Volumn 8, Issue 11, 2014, Pages 11631-11638

  Zhao, Pei ^a   Kim, Sungjin ^b   Chen, Xiao ^b   Einarsson, Erik ^c   Wang, Miao ^d   Song, Yenan ^a   Wang, Hongtao ^a   Chiashi, Shohei ^a   Xiang, Rong ^b   Maruyama, Shigeo ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b UNIVERSITY OF TOKYO   (Japan)

^c State University of New York   (United States)

^d ZHEJIANG UNIVERSITY   (China)

Author keywords

Bilayer graphene; Chemical vapor deposition; Equilibrium; Isotope labeling; Layer by layer epitaxy

Indexed keywords

ETHANOL; GRAPHENE; PHASE EQUILIBRIA;

BILAYER GRAPHENE; CHEMICAL VAPOR DEPOSITIONS (CVD); FUNCTIONALIZATIONS; ISOTOPE LABELING; ISOTOPICALLY LABELED; LAYER BY LAYER; SELF-LIMITING GROWTHS; SURFACE COVERAGES;

CHEMICAL VAPOR DEPOSITION;

EID: 84912571817     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn5049188     Document Type: Article

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