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Volumn 60, Issue , 2014, Pages 890-894

TiO2 films prepared using plasma ion assisted deposition for photocatalytic application

(5) Zhao, C a Child, D a Gibson, D a,b Placido, F a Fu, Richard Y Q a

a UNIVERSITY OF THE WEST OF SCOTLAND (United Kingdom)

b Thin Film Solutions Ltd (United Kingdom)

Author keywords

A. Thin films; B. Plasma deposition; C. Electron microscopy; C. X ray diffraction; D. Catalytic properties; D. Crystal structure

Indexed keywords

CRYSTAL STRUCTURE; DEPOSITION; ELASTIC MODULI; IONS; OPTICAL PROPERTIES; SUBSTRATES; SURFACE ROUGHNESS; TITANIUM DIOXIDE; X RAY DIFFRACTION;

CATALYTIC PROPERTIES; EXTERNAL HEATING; GLASS SUBSTRATES; LOW TEMPERATURES; PHOTO-CATALYTIC; PHOTOCATALYTIC APPLICATION; PLASMA ION ASSISTED DEPOSITION; YOUNG'S MODULUS;

ION BEAM ASSISTED DEPOSITION;

EID: 84911470346 PISSN: 00255408 EISSN: None Source Type: Journal
DOI: 10.1016/j.materresbull.2014.09.022 Document Type: Article

Times cited : (9)

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