High refractive index TiO2 film deposited by electron beam evaporation

Surface Engineering

Volumn 25, Issue 3, 2009, Pages 257-260

  Yao, J K ^a,b   Huang, H L ^c   Ma, J Y ^a,b   Jin, Y X ^a   Zhao, Y A ^a   Shao, J D ^a   He, H B ^a   Yi, K ^a   Fan, Z X ^a   Zhang, F ^c   Wu, Z Y ^c  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

^c XIAMEN UNIVERSITY   (China)

Author keywords

Crystal seed; Electron beam evaporation; High refractive index; Rutile TiO2 film

Indexed keywords

COMPLEX FILTERS; CRYSTAL SEED; ELECTRON BEAM EVAPORATION; GRAIN SIZES; HIGH REFRACTIVE INDEX; LASER COATINGS; LOWER DENSITIES; PACKING DENSITIES; RUTILE TIO2 FILM;

ELECTRODEPOSITION; ELECTRON BEAMS; ELECTRONS; EVAPORATION; LIGHT REFRACTION; OXIDE MINERALS; REFRACTIVE INDEX; REFRACTOMETERS; SURFACE DEFECTS; TITANIUM OXIDES; VAPORS;

CRYSTAL STRUCTURE;

EID: 63849160829     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708408X329498     Document Type: Article

References (16)

1. J. K. Yao, Z. X. Fan, Y. X. Jin, Y. A. Zhao, H. B. He and J. D. Shao: Thin Solid Films, 2008, 516, 1237-1241.
2. J. K. Yao, J. D. Shao, H. B. He and Z. X. Fan: Vacuum, 2007, 81, 1023-1028.
3. N. Martin, C. Rousselot, D. Rondot, F. Palmino and R. Mercier: Thin Solid Films, 1997, 300, 113-121.
4. A. Lei and G. P. Wang: Chin. Phys. Lett., 2006, 23, 388-391.
5. C. T. Wei, H. Ping and D. Shieh: Jpn J. Appl. Phys., 2006, 45, 1783-1787.
6. M. H. Asghar, F. Placido and S. Naseem: Opt. Eng., 2007, 46, 023802.
7. B. Fan, M. Suzuki and K. Tang: Appl. Opt., 2006, 45, 1461-1464.
8. B. Hunsche, M. Vergohl and A. Ritz: Thin Solid Films, 2006, 502, 188-192.
9. A. Ritz and H. Moench: in 'Optical interference coatings, OSA technical digest series', paper TuF7; 2004, Washington D.C., Optical Society of America.
10. G. J. Exarhos and P. L. Morse: Nat. Bur. Stand. (US) Spec. Publ., 1986, 727, 262-271.
11. J. K. Yao, Z. X. Fan, Y. X. Jin, Y. A. Zhao, H. B. He and J. D. Shao: J. Appl Phys., 2007, 102, 063105.
12. N. Albertinetti and H. T. Minden: Appl. Opt., 1996, 35, 5620-5625.
13. K. H. Guenther: Appl. Opt., 1981, 20, 1034-1038.
14. R. Swanepoel: J. Phys. E: Sci. Instrum., 1983, 16E, 1214-1222.
15. J. K. Yao, J. D. Shao, H. B. He and Z. X. Fan: Appl. Surf Sci., 2007, 253, 8911-8914.
16. S. H. Kim, J. H. Lee, C. K. Hwangbo and S. M. Lee: Surf. Coat. Technol., 2002, 158-159, 457.