Influence of oxygen plasma treatments on the structural properties of c-Si

Applied Physics Letters

Volumn 72, Issue 21, 1998, Pages 2683-2685

  Nickel, N H ^a   Sieber, I ^a  

^a HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 21944434872     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121098     Document Type: Article

References (17)

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