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Volumn , Issue , 2003, Pages 123-126

Subthreshold characteristics of p-type triple-gate MOSFETs

Author keywords

[No Author keywords available]

Indexed keywords

P-TYPE; SUBTHRESHOLD CHARACTERISTICS; TRIPLE-GATE MOSFETS;

EID: 84907697695     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.2003.1256826     Document Type: Conference Paper
Times cited : (14)

References (15)
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  • 3
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  • 5
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  • 6
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  • 11
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    • The enhancement of gate-induced-drain-leakage (GIDL) current in short channel SOI MOSFET and its application in measuring lateral bipolar current gain β
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    • J. Chen et al., "The Enhancement of Gate-Induced-Drain-Leakage (GIDL) Current in Short Channel SOI MOSFET and its Application in Measuring Lateral Bipolar Current Gain β", IEEE Electron Device Lett., Vol. 13, No. 11, pp. 572-574, November 1992.
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  • 12
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.