Narrow-channel effects in LOCOS-isolated SOI MOSFETs with variable thickness

IEEE International SOI Conference

Volumn , Issue , 2000, Pages 66-67

  Pretet, J ^a   Ernst, T ^a   Cristoloveanu, S ^a   Raynaud, C ^a   Ioannou, D ^a  

^a Grenoble INP Phelma   (France)

Author keywords

[No Author keywords available]

Indexed keywords

GATES (TRANSISTOR); SEMICONDUCTING FILMS; SILICON ON INSULATOR TECHNOLOGY; ULTRATHIN FILMS;

NARROW-CHANNEL EFFECTS;

MOSFET DEVICES;

EID: 0034474126     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)