Microstructural and physical properties of titanium nitride coatings produced by CVD process

Materials Science and Engineering: A

Volumn 286, Issue 2, 2000, Pages 324-330

  Kashani, H ^a   Heydarzadeh Sohi, M ^a   Kaypour, H ^a  

^a UNIVERSITY OF TEHRAN   (Iran)

Author keywords

CVD; Microstructure; TiN

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; GRAIN SIZE AND SHAPE; GROWTH (MATERIALS); HARDNESS; LATTICE CONSTANTS; MORPHOLOGY; PHYSICAL PROPERTIES; REACTION KINETICS; SURFACE ROUGHNESS; TEMPERATURE;

ADHERENCE; DEPOSITION RATE; TITANIUM TETRACHLORIDE;

TITANIUM NITRIDE;

INORGANIC COATING; MICROSTRUCTURE; PHYSICAL PROPERTY; TITANIUM NITRIDE; VAPOR DEPOSITION;

EID: 0343081045     PISSN: 09215093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-5093(00)00744-9     Document Type: Article

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