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Volumn 4, Issue 65, 2014, Pages 34448-34453

Copper reduction and atomic layer deposition by oxidative decomposition of formate by hydrazine

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; DEPOSITION; HYDRAZINE;

EID: 84906228257     PISSN: None     EISSN: 20462069     Source Type: Journal    
DOI: 10.1039/c4ra07003h     Document Type: Article
Times cited : (20)

References (25)
  • 1
    • 84906254802 scopus 로고    scopus 로고
    • International Technology Roadmap for Semiconductors, 2011
    • International Technology Roadmap for Semiconductors, http://www.itrs.net/ , 2011


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.