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Nanoscale

Volumn 6, Issue 16, 2014, Pages 9846-9851

Broadband antireflection and field emission properties of TiN-coated Si-nanopillars

(6) Chang, Yuan Ming a Ravipati, Srikanth a Kao, Pin Hsu b Shieh, Jiann c Ko, Fu Hsiang a Juang, Jenh Yih a

a NATIONAL CHIAO TUNG UNIVERSITY (Taiwan)

b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Taiwan)

c NATIONAL UNITED UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC LAYER DEPOSITION; COATINGS; FIELD EMISSION; NANOSTRUCTURES; REFRACTIVE INDEX; SILICON; ULTRATHIN FILMS;

BROADBAND ANTI REFLECTIONS; EFFECTIVE WORK FUNCTION; ENHANCED FIELD EMISSION; FIELD EMISSION PROPERTY; FIELD-EMISSION CHARACTERISTICS; LONG-WAVELENGTH-RANGE; OPTOELECTRONIC PROPERTIES; SILICON NANOPILLARS;

TITANIUM NITRIDE;

EID: 84905170759 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c4nr01874e Document Type: Article

Times cited : (7)

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