Electrochemical strain microscopy of silica glasses

Journal of Applied Physics

Volumn 116, Issue 6, 2014, Pages

  Proksch, R ^a  

^a United States   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC FIELDS; FERROELECTRIC MATERIALS; FUNCTIONAL MATERIALS; FUSED SILICA; HYSTERESIS; HYSTERESIS LOOPS; SCANNING PROBE MICROSCOPY;

CATIONIC CONCENTRATION; ELECTROCHEMICAL RESPONSE; ELECTROCHEMICAL STRAIN; ELECTROCHEMICAL STRAIN MICROSCOPIES; HYSTERETIC BEHAVIOR; PIEZORESPONSE FORCE MICROSCOPY; RELAXATION BEHAVIORS; TEMPERATURE DEPENDENT;

GLASS;

EID: 84903956106     PISSN: 00218979     EISSN: 10897550     Source Type: Journal    
DOI: 10.1063/1.4891349     Document Type: Article

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