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Volumn 2, Issue 29, 2014, Pages 5864-5869
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Fabrication of functional nanosized patterns with UV-curable polysilsesquioxane on photovoltaic protective glass substrates using hybrid nano-imprint lithography
c
Hunetplus
(South Korea)
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Author keywords
[No Author keywords available]
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Indexed keywords
CURING;
NANOIMPRINT LITHOGRAPHY;
PHOTOVOLTAIC CELLS;
SUBSTRATES;
ANGLES OF INCIDENCE;
MONITORING SYSTEM;
MOTH-EYE STRUCTURE;
NANO-SIZED PATTERNS;
PHOTOVOLTAIC;
POLYSILSESQUIOXANES;
PROTECTIVE GLASS;
UV CURABLE;
GLASS;
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EID: 84903954162
PISSN: 20507534
EISSN: 20507526
Source Type: Journal
DOI: 10.1039/c4tc00101j Document Type: Article |
Times cited : (19)
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References (28)
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