Metrology of optically-unresolved features using interferometric surface profiling and RCWA modeling

Optics Express

Volumn 16, Issue 6, 2008, Pages 3970-3975

  De Groot, Peter ^a   De Lega, Xavier Colonna ^a   Liesener, Jan ^a   Darwin, Michael ^a  

^a ZYGO CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIFFRACTION GRATINGS; INTERFEROMETRY; THREE DIMENSIONAL; WAVELENGTH;

GRATING STRUCTURES; INTERFEROMETRIC SURFACE PROFILING; OPTICALLY UNRESOLVED FEATURES; SILICON ETCH DEPTH;

WAVE INTERFERENCE;

ARTICLE; COMPUTER SIMULATION; INTERFEROMETRY; MATERIALS TESTING; METHODOLOGY; MICROSCOPY; REPRODUCIBILITY; SENSITIVITY AND SPECIFICITY; THEORETICAL MODEL;

COMPUTER SIMULATION; INTERFEROMETRY; MATERIALS TESTING; MICROSCOPY; MODELS, THEORETICAL; REPRODUCIBILITY OF RESULTS; SENSITIVITY AND SPECIFICITY;

EID: 41149142570     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.16.003970     Document Type: Article

References (7)

1. P. de Groot and L. Deck, "Surface profiling by analysis of white-light interferograms in the spatial frequency domain," J. Mod. Opt. 42, 389-401 (1995).
2. M. G. Moharam and T. K. Gaylord, "Diffraction analysis of dielectric surface-relief gratings," J. Opt. Soc. Am. 72, 1385-1392, (1982).
3. M. G. Moharam, E. B. Grann, and D. A. Pommet, "Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings," J. Opt. Soc. Am. A 12, 1068 - 1076 (1995)
4. C. J. Raymond, "Scatterometry for Semiconductor Metrology," in Handbook of Silicon Semiconductor Metrology, A. J. Deibold, ed., (Marcel. Dekker, Inc., New York, 2001)
5. A. Tavrov, J. Schmit, N. Kerwien, W. Osten, and H. Tiziani, "Diffraction-induced coherence levels," Appl. Opt. 44, 2202-2212 (2005)
6. M. Totzeck, "Numerical, simulation of high-NA quantitative polarization microscopy and corresponding near-fields," Optik 112 (2001) 381-390
7. P. de Groot, R. Stoner, and X. Colonna De Lega, "Profiling complex surface structures using height scanning interferometry," US Patent No. 7,151,607 (2006).