Multilayer deposition of ceramic and metal at room temperature using nanoparticle deposition system (NPDS) and planarization process

International Journal of Advanced Manufacturing Technology

Volumn 72, Issue 1-4, 2014, Pages 41-46

  Chun, Doo Man ^a   Kim, Chung Soo ^b   Choi, Jung Oh ^b   Lee, Gil Yong ^b   Lee, Caroline Sunyong ^c   Ahn, Sung Hoon ^b  

^a University of Ulsan   (South Korea)

^b Seoul National University   (South Korea)

^c Hanyang University   (South Korea)

Author keywords

Metal and ceramic deposition; Multilayer deposition; Nanoparticle deposition system (NPDS); Planarization; Room temperature processing

Indexed keywords

ALUMINUM; CERAMIC MATERIALS; FILM GROWTH; FILM PREPARATION; METAL NANOPARTICLES; METALS; MULTILAYERS; SAPPHIRE; SILICON; TIN; TITANIUM DIOXIDE;

CERAMIC DEPOSITIONS; MULTILAYER DEPOSITIONS; NANO-PARTICLE DEPOSITION SYSTEMS (NPDS); PLANARIZATION; ROOM TEMPERATURE PROCESSING;

DEPOSITION;

EID: 84903273814     PISSN: 02683768     EISSN: 14333015     Source Type: Journal    
DOI: 10.1007/s00170-013-5327-9     Document Type: Article

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