Investigation of physicochemical and tribological properties of transparent oxide semiconducting thin films based on Ti-V oxides

Materials Science- Poland

Volumn 31, Issue 3, 2013, Pages 434-445

  Mazur, M ^a   Sieradzka, K ^a   Kaczmarek, D ^a   Domaradzki, J ^a   Wojcieszak, D ^a   Domanowski, P ^b  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b UNIVERSITY OF TECHNOLOGY AND LIFE SCIENCES   (Poland)

Author keywords

Magnetron sputtering; Ti V oxide thin films; Transparent oxide semiconductors; Tribological properties

Indexed keywords

FILM PREPARATION; MAGNETRON SPUTTERING; PROTECTIVE COATINGS; THIN FILMS; TRIBOLOGY;

AMORPHOUS STRUCTURES; OXIDE THIN FILMS; REACTIVE MAGNETRON SPUTTERING METHOD; SEMICONDUCTING THIN FILMS; STRUCTURAL AND OPTICAL PROPERTIES; STRUCTURAL INVESTIGATION; TRANSPARENT OXIDE SEMICONDUCTOR; TRIBOLOGICAL PROPERTIES;

TITANIUM OXIDES;

EID: 84902478888     PISSN: 01371339     EISSN: None     Source Type: Journal    
DOI: 10.2478/s13536-013-0122-8     Document Type: Article

References (29)

1. OHTA H., HOSONO H., Mater. Today, 7 (2004), 42.
2. HAYASHI Y. et al., Vacuum, 74 (2004), 607.
3. GRANQVIST C. G., HULTAKER A., Thin Solid Films, 411 (2002), 1.
4. FURUBAYASHI Y. et al., Thin Solid Films, 496 (2006), 157.
5. SIERADZKA K., DOMARADZKI J., PROCIÓW E. L., MAZUR M., GÓRNICKA B., KACZMAREK D., Cent. Eur. J. Phys., 9 (2011), 313.
6. SIERADZKA K., MAZUR M., WOJCIESZAK D., DOMARADZKI J., KACZMAREK D., PROCIÓ W E. L., Thin Solid Films, 520 (2012), 3472.
7. GRIGOROV K. G. et al., Surf. Sci., 605 (2011), 775.
8. MARTINU L., POITRAS D., J. Vac. Sci. Technol. A, 18 (2000), 2619.
9. XI J.-Q. et al., Nat. Photonics, 1 (2007), 176.
10. WOJCIESZAK D. et al., Pol. J. Chem. Technol., 14 (3) (2012), 1.
11. WOJCIESZAK D., KACZMAREK D., DOMARADZKI J., MAZUR M., Int. J. Photoenergy, (2013), http://dx. doi. org/10. 1155/2013/526140
12. 2: (W, Cr, Mo) thin film, IEEE Proceedings of 2011 International Students and Young Scientists Workshop "Photonics and Microsystems", Cottbus, Germany, 8-10 July 2011, pp. 25-30.
13. DOMARADZKI J., WOJCIESZAK D., PROCIÓW E., KACZMAREK D., WINIARSKI A., SZADE J., J. Nanosci. Nanotechno., 11 (10) (2011), 8744.
14. KACZMAREK D., DOMARADZKI J., BORKOWSKA A., PODHORODECKI A., MISIEWICZ J., SIERADZKA K., Opt. Appl., 37 (4) (2007), 433.
15. SONG H., PENG T., CAI P., YI H., YAN C., Catal. Lett., 113 (1-2) (2007), 54.
16. DOMARADZKI J., KACZMAREK D., BORKOWSKA A., WOLCYRZ M., PASZKIEWICZ B., Phys. Status Solidi A, 203 (2006), 2215.
17. DOMARADZKI J., NITSCH K., PROCIOW E., KACZMAREK D., PASZKIEWICZ B., Solid State Ionics, 176 (2005), 2177.
18. CHAIN E. E., Appl. Opt., 30 (1991), 2782.
19. PROCIOW E. L., DOMARADZKI J., KACZMAREK D., BERLICKI T., Polish patent No P382163, 2007.
20. KACZMAREK D., PROCIÓ W E, DOMARADZKI J., BORKOWSKA A., MIELCAREK W., WOJCIESZAK D., Mat. Sci. Pol., 26 (1) (2008), 113.
21. KLUG H. P., ALEXANDER L. E., In: H. P. KLUG, L. E. ALEXANDER (Eds. ), X-ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd edition, John Wiley and Sons, New York, 1974, p. 635.
22. OGWU A. A., BOUQUEREL E., ADEMOSU O., MOH S., CROSSAN E., PLACIDO F., Acta Mater., 53 (2005), 5151.
23. SHARFRIN E., ZISMAN W. A., J. Phys. Chem., 64 (5) 1960, 519.
24. KWOK D. Y., NEUMANN A. W., Adv. Colloid Interfac., 81 (1999), 167.
25. SCHRODER D. K., Semiconductor material and device characterization, AWiley-Interscience Publication, New York, 1998.
26. MICHEL M. D., MIKOWSKI A., LEPIENSKI C. M., FOERSTER C. E., SERBENA F. C., J. Non-Cryst. Solids, 348 (2004), 131.
27. BOURHIS E. LE, METAYER D., J. Non-Cryst. Solids, 272 (2000), 34.
28. ZISMAN W. A., Handbook of Adhesives, Skeist, I., Ed: van Nostrand, NewYork, 1977
29. FOWKES F. M., J. Adhesion, 4 (1972), 155.