Electrical properties of nanocrystalline HfTiO 4 gate insulator

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 9, 2006, Pages 2215-2218

  Domaradzki, J ^a   Kaczmarek, D ^a   Borkowska, A ^a   Wolcyrz, M ^b   Paszkiewicz, B ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b INSTITUTE OF LOW TEMPERATURE AND STRUCTURE RESEARCH   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

HFTIO4 GATE INSULATOR; OXIDE-SEMICONDUCTOR INTERFACE; REACTIVE MAGNETRON SPUTTERING; SOLID SOLUTION THIN FILMS;

ELECTRIC INSULATORS; ELECTRIC PROPERTIES; GATES (TRANSISTOR); HAFNIUM COMPOUNDS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SOLID SOLUTIONS; THIN FILMS;

NANOSTRUCTURED MATERIALS;

EID: 33746335966     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200566011     Document Type: Conference Paper

References (7)

1. F. Chen, X. Bin, C. Hella, X. Shi, W. L. Gladfelter, and S. A. Campbell, Microelectron. Eng. 72,263 (2004).
2. J. Domaradzki, E. L. Prociow, D. Kaczmarek, T. Berlicki, A. Podhorodecki, R. Kudrawiec, and J. Misiewicz, Mater. Sci. Eng. B 109(1-3), 250 (2004).
3. J. Domaradzki, E. L. Prociow, D. Kaczmarek, and W. Mielcarek, in: Proceedings of the 5th International Conference on Advanced Semiconductor Devices and Microsystems (ASDAM 2004), Smolenice Castle, Slovakia, 2004) (IEEE, Piscataway, 2004), pp. 119-122 (IEEE Catalog No. 04EX867).
4. S. Kochowski, K. Nitsch, B. Paszkiewicz, and R. Paszkiewicz, Thin Solid Films 444, 208 (2003).
5. J. Domaradzki, K. Nitsch, E. L. Prociow, D. Kaczmarek, and B. Paszkiewicz, Solid State Ion. 176(25-28), 2175 (2005).
6. Powder Diffraction File (PDF-2) Database, No. 40-0794, ICDD (1997).
7. S. Kochowski and K. Nitsch, Thin Solid Films 415, 133 (2002).