Influence of substrate type and its placement on structural properties of TiO2 thin films prepared by the high energy reactive magnetron sputtering method

Materials Science- Poland

Volumn 26, Issue 1, 2008, Pages 113-117

  Kaczmarek, D ^a   Prociow, E L ^a   Domaradzki, J ^a   Borkowska, A ^a   Mielcarek, W ^b   Wojcieszak, D ^a  

^a WROCLAW UNIVERSITY OF TECHNOLOGY   (Poland)

^b ELECTROTECHNICAL INSTITUTE   (Poland)

Author keywords

Reactive sputtering; Structural properties; Thin films; TiO2

Indexed keywords

(PL) PROPERTIES;

STRUCTURAL PROPERTIES;

EID: 45849146589     PISSN: 01371339     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (6)

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4. PROCIOW E.L., DOMARADZKI J., KACZMAREK D., BERLICKI T., Patent PL 382163, April 17, 2007.
5. KLUG H., ALEXANDER L., X-ray diffraction procedures, Wiley, New York, 1974.
6. Powder Diffraction File, Joint Committee on Powder Diffraction Standards ASTM, Philadelphia, PA, 1967, Card 21-1276.