Size dependence of compressive strain in graphene flakes directly grown on SiO2/Si substrate

Journal of Physical Chemistry C

Volumn 118, Issue 23, 2014, Pages 12526-12531

  Song, Yuqing ^a   Liu, Jinyang ^a,b   Quan, Lin ^a   Pan, Nan ^a,c   Zhu, Hong ^a   Wang, Xiaoping ^a,c  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b FUJIAN NORMAL UNIVERSITY   (China)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; SILICON; STRAIN RELAXATION; THERMAL EXPANSION;

BLUE SHIFT; CATALYTIC METHODS; COEFFICIENTS OF THERMAL EXPANSIONS; COMPRESSIVE STRAIN; EDGE REGION; IN-PLANE COMPRESSIVE STRAIN; PREPARATION METHOD; SIZE DEPENDENCE;

GRAPHENE;

EID: 84902455669     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp501897a     Document Type: Article

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