Novel error mode analysis method for graphoepitaxial directed self-assembly lithography based on the dissipative particle dynamics method

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8680, Issue , 2013, Pages

  Kodera, Katsuyoshi ^a   Maeda, Shimon ^a   Tanaka, Satoshi ^a   Mimotogi, Shoji ^a   Seino, Yuriko ^a   Yonemitsu, Hiroki ^a   Sato, Hironobu ^a   Azuma, Tsukasa ^a  

^a TOSHIBA CORPORATION   (Japan)

Author keywords

Direct self assembly lithography; Dissipative particle dynamics method

Indexed keywords

DIRECTED SELF-ASSEMBLY LITHOGRAPHIES; DISSIPATIVE PARTICLE DYNAMICS; DISSIPATIVE PARTICLE DYNAMICS METHOD; ERROR MODE; PROCESS CONDITION; SELF-ASSEMBLING MATERIALS;

PHOTOLITHOGRAPHY; RANDOM ERRORS; SYSTEMATIC ERRORS;

SELF ASSEMBLY;

EID: 84878395432     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.2011439     Document Type: Conference Paper

References (8)

1. Glenn Fredrickson, "Field-based simulations of directed block copolymer assembly", 2012 MRS Fall Meeting and Exhibit, S9.01, (2012).
2. th International Microprocesses and Nanotechnology Conference (MNC2012), 2A-10-4, (2012).
3. Hiroki Yonemitsu, Hironobu Sato, Yuriko Seino, Hirokazu Kato, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Katsuyoshi Kodera, Tsukasa Azuma, "Process and simulation studies of contact holes fabricated using directed self-assembly lithography", 2012 MRS Fall Meeting and Exhibit, S9.04, (2012).
4. Hironobu Sato, Hiroki Yonemitsu, Yuriko Seino, Hirokazu Kato, Masahiro Kanno, Katsutoshi Kobayashi, Ayako Kawanishi, Katsuyoshi Kodera, and Tsukasa Azuma, "Dissipative particle dynamics simulations to optimize contact hole shrink process using graphoepitaxial directed self-assembly", Proc. SPIE Advanced lithography 2013 to be submitted.
5. Makoto Muramatsu, Mitsuaki Iwashita, Takahiro Kitano, Takayuki Toshima, Mark Somervell, Yuriko Seino, Daisuke Kawamura, Masahiro Kanno, Katsutoshi Kobayashi, Tsukasa Azuma, "Nanopatterning of diblock copolymer directed self-assembly lithography with wet development", Journal of Micro/Nanolithography, MEMS, and MOEMS 11(3), 031305 (2012)
6. Yuriko Seino, Hiroki Yonemitsu, Hironobu Sato, Masahiro Kanno, Hirokazu Kato, Katsutoshi Kobayashi, Ayako Kawanishi, Tsukasa Azuma, Makoto Muramatsu, Seiji Nagahara, Takahiro Kitano, Takayuki Toshima, "Contact hole shrink process using directed self-assembly", Proc. SPIE 8323, Alternative Lithographic Technologies IV, 83230Y, (2012).
7. th International Conference on Micro and Nano Engineering (MNE2012), P088-046, (2012).
8. Robert D. Groot, Patrick B. Warren, J. Chem. Phys. 107, 4423 (1997).