Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8323, Issue , 2012, Pages

  Doerk, Gregory S ^a   Liu, Chi Chun ^a   Cheng, Joy Y ^a   Rettner, Charles T ^a   Pitera, Jed W ^a   Krupp, Leslie ^a   Topuria, Teya ^a   Arellano, Noel ^a   Sanders, Daniel P ^a  

^a IBM ALMADEN RESEARCH CENTER   (United States)

Author keywords

block copolymer; directed self assembly; pattern placement; registration

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; PHOTOLITHOGRAPHY; SELF ASSEMBLY;

DIRECTED SELF-ASSEMBLY; PATTERN PLACEMENT ERRORS; PATTERN PLACEMENTS; PLACEMENT ACCURACY; POLYMER PATTERNS; POSITIVE CORRELATIONS; REGISTRATION; SPATIAL FREQUENCY;

BLOCK COPOLYMERS;

EID: 84878381456     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.916421     Document Type: Conference Paper

References (16)

1. Yang, J.K.W. Jung, Y.S., Chang, J.B., Mickiewicz, R.A., Alexander-Katz, A., Ross, C.A., Berggren, K.K., "Complex self-assembled patterns using sparse commensurate templates with locally varying motifs," Nature Nanotech. 5, 256-260 (2010).
2. Bita, I., Wang, J.K.W., Jung, Y.S., Ross, C.A., Thomas, E.L., Berggren, K.K., "Graphoepitaxy of self-assembled block copolymers on two-dimensional periodic patterned templates,". Science 321, 939-943 (2008).
3. Segalman, R.A., Yokoyama, H., Kramer, E.J., "Graphoepitaxy of spherical domain block copolymer films" Adv. Mater. 13, 1152-1155 (2001).
4. Black, C.T., Bezencenet, O., "Nanometer-scale pattern registration and alignment by directed block-copolymer selfassembly," IEEE Trans. Nanotechnol. 3, 412-415 (2004).
5. Cheng, J.Y., Ross, C.A., Thomas, E.L., Smith, H.I., Vansco, G.J., "Fabrication of nanostructures with long-range order using block-copolymer lithography," Appl. Phys. Lett. 81, 3657-3659 (2002).
6. Chai, J., Wang, D., Fan, X., Buriak, J.M., "Assembly of aligned linear metallic patterns on silicon" Nature Nanotech. 2, 500-506 (2007).
7. Jung, Y.S., Ross, C.A., "Orientation-controlled self-assembled nanolithography using a polystyrene-polydimethylsiloxane block copolymer," Nano. Lett. 7, 2046-2050 (2007).
8. Kim, S.O., Solak, H.H., Stoykovich, M.P., Ferrier, N.J., de Pablo, J.J., Nealey, P.F., "Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates" Nature 424, 411-414 (2003).
9. Stoykovich, M.P., Muller, M., Kim, S.O., Solak, H.H., Edwards, E.W., de Pablo, J.J., Nealey, P.F., "Directed assembly of block copolymer blends into nonregular device-oriented structures," Science 308, 1442-1446 (2005).
10. Cheng, J.Y., Rettner, C.T., Sanders, D.P., Kim, H.C., Hinsberg, W.D., "Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers," Adv. Mater. 20, 3155-3158 (2008).
11. Liu, C.C., Nealey, P.F., Raub, A.K., Hakeem, P.J., Brueck, S.R.J., Han, E., Gopalan, P., "Integration of block copolymer directed assembly with 193 immersion lithography," J. Vac. Sci. Tech. B 28, C6B30-C6B34 (2010).
12. Ruiz, R., Kang, H., Detcheverry, F.A., Dobisz, E., Kercher, D.S., Albrecht, T.R., de Pablo, J.J., Nealey, P.F. "Density multiplication and improved lithography by directed block copolymer assembly," Science 321, 936-939 (2008).
13. Black, C.T., Ruiz, R., Breyta, G., Cheng, J.Y., Colburn, M.E., Guarini, K.W., Kim, H.C., Zhang, Y., "Polymer self-assembly in semiconductor microelectronics," IBM J. Res. Dev. 51, 605-633 (2007).
14. Semiconductor Industry Association, International Technology Roadmap for Semiconductors: 2009 Edition; see http://public.itrs.net/links/2009ITRS/ Home2009.htm
15. Ruiz, R., Dobisz, E., Albrecht, T.R., "Rectangular patterns using block copolymer directed assembly for high bit aspect ratio patterned media," ACS Nano 5, 79-84 (2011).
16. Liu, C.C., Craig, G.S.W., Kang, H., Ruiz, R., Nealey, P.F., Ferrier. N.J., "Practical implementation of order parameter calculation for directed assembly of block copolymer thin films," J. Polym. Sci. B: Polym. Phys. 48, 2589-2603 (2010).