Applying ILT mask synthesis for co-optimizing design rules and DSA process characteristics

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 9052, Issue , 2014, Pages

  Dam, Thuc ^a   Stanton, William ^a  

^a SYNOPSYS INC   (United States)

Author keywords

Design Rule Development; DSA; ILT; Inverse Lithography; MRC; OPC; SMO; Source mask optimization

Indexed keywords

LITHOGRAPHY; MANUFACTURE;

DESIGN RULES; DSA; ILT; INVERSE LITHOGRAPHY; MRC; OPC; SMO; SOURCE-MASK OPTIMIZATIONS;

DESIGN;

EID: 84901747400     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.2046370     Document Type: Conference Paper

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