Exploring the impact of mask making constraints on double patterning design rules

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 8166, Issue , 2011, Pages

  Dam, Thuc ^a   Sinn, Robert ^a   Rissman, Paul ^a   Gleason, Bob ^a  

^a Luminescent Technologies Inc   (United States)

Author keywords

Design rule development; ILT; Inverse Lithography; MRC; OPC; SMO; Source mask optimization

Indexed keywords

DESIGN RULES; ILT; INVERSE LITHOGRAPHY; MRC; OPC; SMO;

LITHOGRAPHY; OPTIMIZATION; PHOTOMASKS;

DESIGN;

EID: 81455147487     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.896963     Document Type: Conference Paper

References (10)

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