Maintenance scheduling of plasma etching chamber in wafer fabrication for high-yield etching process

IEEE Transactions on Semiconductor Manufacturing

Volumn 27, Issue 2, 2014, Pages 204-211

  Duc, Le Minh ^a   Tan, Cher Ming ^a   Luo, Ming ^b   Leng, Ian Chan Hian ^b  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

^b SINGAPORE INSTITUTE OF MANUFACTURING TECHNOLOGY   (Singapore)

Author keywords

Inductive couple plasma etching; Maintenance scheduling; Negative binomial distribution; Particle count; Particle per wafer pass (PWP)

Indexed keywords

INDUCTIVELY COUPLED PLASMA; SCHEDULING; STOCHASTIC SYSTEMS;

INDUCTIVE COUPLE PLASMA ETCHINGS; MAINTENANCE SCHEDULING; NEGATIVE BINOMIAL DISTRIBUTION; PARTICLE COUNTS; PARTICLE PER WAFER (PWP) PASS;

MAINTENANCE;

EID: 84900810816     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2014.2304461     Document Type: Article

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