Characterization of fine particle trapping in a plasma-enhanced chemical vapor deposition reactor

Journal of Applied Physics

Volumn 92, Issue 9, 2002, Pages 5525-5531

  Setyawan, Heru ^a   Shimada, Manabu ^a   Okuyama, Kikuo ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EQUILIBRIUM POSITIONS; FINE PARTICLES; HIGH RATE; LARGE PARTICLES; LASER LIGHT SCATTERING TECHNIQUES; LOW RATES; PARTICLE CLOUDS; PARTICLE NUMBER CONCENTRATION; PARTICLE TRAPS; RADIO FREQUENCIES; RF-POWER; SHOWERHEAD; TRAPPED PARTICLE;

CHEMICAL VAPOR DEPOSITION; FLOW RATE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VAPORS;

FLOW OF GASES;

EID: 18744361948     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1501755     Document Type: Article

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