Current capabilities and limitations of in situ particle monitors in silicon processing equipment

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 6, 1996, Pages 2983-2993

  Takahashi, Ken M ^a   Daugherty, John E ^a  

^a NOKIA RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEFECTS; ELECTRIC CURRENTS; INTEGRATED CIRCUIT MANUFACTURE; OPTIMIZATION; PARTICLE SIZE ANALYSIS; PRESSURE EFFECTS; PROCESS CONTROL; REAL TIME SYSTEMS; SENSITIVITY ANALYSIS; SENSORS; SILICON WAFERS; TRANSPORT PROPERTIES;

CURRENT CAPABILITY; GRAVITATIONAL SETTLING; HIGH PARTICLE EXCURSIONS; IN CHAMBER SENSORS; IN SITU PARTICLE MONITORS; PARTICLE INERTIA; SILICON PROCESSING EQUIPMENT;

PARTICLE DETECTORS;

EID: 0030288366     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580257     Document Type: Article

References (53)

1. F. Lee, E. M. Howard, and D. DeMuynck, Microcontamination 12 (3), 33 (1994).
2. P. Burggraaf, Semicond. Int. 14, 78 (1991).
3. B. Y. H. Liu, Semicond. Int. 17, 75 (1994).
4. R. S. Rowland, Semicond. Int. 17, 164 (1994).
5. L. Peters, Semicond. Int. 15, 52 (1992).
6. R. A. Bowling and G. B. Larrabee, J. Electrochem. Soc. 136, 497 (1989).
7. R. A. Bowling, G. B. Larrabee, and W. G. Fisher, J. Environ. Sci. 32, 22 (1989).
8. P. G. Borden, Microcontamination 9 (12), 38 (1991).
9. D. L. Dance, R. W. Burghard, and R. J. Markle, Microcontamination 10 (5), 21 (1992).
10. L. Peters, Semicond. Int. 13, 38 (1990).
11. H. T. Sommer, Proceedings of the 38th Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 32.
12. A. Lieberman, CleanRooms 9, 26 (1995).
13. J. Blesener and T. Halvorsen, in Proceedings of the 38th Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 26.
14. C. E. Utter, S. C. Knollenberg, and R. G. Knollenberg, Proceedings of the 38th Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 50.
15. P. C. D. Hobbs, Appl. Opt. 34, 1579 (1995).
16. W. D. Reents, Jr., S. W. Downey, A. B. Emerson, A. M. Mujsce, A. J. Muller, D. J. Siconolfi, J. D. Sinclair, and A. G. Swanson, Plasma Sources Sci. Technol. 3, 369 (1994).
17. P. J. Ziemann, P. Liu, N. P. Rao, D. B. Kittelson, and P. H. McMurry, J. Aerosol Sci. 26, 745 (1995).
18. P. G. Borden, Microcontamination 9 (4), 43 (1991).
19. W. Weisenberger, Semicond. Int. 11, 188 (1988).
20. R. W. Burghard, D. J. McCarron, R. J. Markle, and H. K. Nguyen, Proceedings of the 38th Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 338.
21. S. Myers, D. McCarron, and J. Blake, Nucl. Instrum. Methods Phys. Res. B 74, 243 (1993).
22. W. Weisenberger, S. Chereckdjian, P. G. Borden, and W. Knodle, Nucl. Instrum. Methods Phys. Res. B 37-38, 644 (1989).
23. P. G. Borden and L. A. Larson, IEEE Trans. Semicond. Manuf. 2, 141 (1989).
24. P. G. Borden, Microcontamination 9 (8), 35 (1991).
25. J. Zhao, B. Y. H. Liu, and T. H. Kuehn, Solid State Technol. 33, 85 (1990).
26. P. G. Borden, Microcontamination 9 (5), 43 (1991).
27. H. K. Nguyen and J. Hunter, Proceedings of the Symposium on Contamination Control and Defect Reduction in Semiconductor Manufacturing I, edited by D. N. Schmidt (Electrochemical Society, Pennington, NJ, 1992), pp. 134-143.
28. J. Hunter and H. K. Nguyen, Semicond. Int. 16, 80 (1993).
29. P. G. Borden, Microcontamination 9 (10), 45 (1991).
30. C. C. Maffei, Proceedings of Microcontamination 90 (Cannon Communications, Inc., Santa Clara, CA, 1990), pp. 446-472.
31. P. G. Borden, Microcontamination 9 (9), 34 (1991).
32. D. Greenstein, H. Yang, A. Tao, P. Kinney, J. Zhao, A. Gupta, and B. Fishkin, in Ref. 30, pp. 485-504.
33. D. Greenstein, H. Yang, A. Tao, P. Kinney, J. Zhao, A. Gupta, and B. Fishkin, Microcontamination 9 (3), 21 (1991).
34. T. Winter, R. Woodward, P. Niemyski, and T. H. Fu, Proceedings of the 41st Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 74.
35. B. Fardi, B. S. MacGibbon, S. Tripathi, and F. Moghadam, Proceedings of the 41st Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 82.
36. B. Newboe, Semicond. Int. 16, 38 (1993).
37. B. Fardi, C. Sirovy, B. Huff, and F. Moghadam, Proceedings of the 41st Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 91.
38. J. J. Wu, J. M. Miller, and M. T. Tinker, J. IES 36, 21 (1993).
39. P. G. Borden, Microcontamination 9 (3), 39 (1991).
40. S. F. Fang, B. Hallett, A. Merrian, C. Musilli, P. Foglieti, and T. H. Fu, Proceedings of the 41st Annual Technical Meeting (Institute of Environmental Sciences, Mount Prospect, IL, 1992), Vol. 1, p. 68.
41. P. G. Borden, Microcontamination 9 (11), 33 (1991).
42. J. Logan and J. McGill, J. Vac. Sci. Technol. A 10, 1875 (1992).
43. J. E. Daugherty and D. B. Graves, J. Appl. Phys. 78, 2279 (1995).
44. P. S. Epstein, Phys. Rev. 23, 710 (1924).
45. N. A. Fuchs, The Mechanics of Aerosols (Dover, New York, 1964), p. 22.
46. K. T. Paw U and D. A. Braaten, Aerosol. Sci. Technol. 23, 72 (1995).
47. P. Liu, Ph.D. thesis, Department of Mechanical Engineering, University of Minnesota, 1994.
48. P. Liu, P. J. Ziemann, D. B. Kittelson, and P. H. McMurry, Aerosol. Sci. Technol. 22, 293 (1995).
49. W. G. Fisher, Particle Control for Semiconductor Manufacturing, edited by R. P. Donovan (Marcel Dekker, New York, 1990).
50. S. Leung, B. Adibi, S. Moffat, B. Fishkin, and P. Kinney, Nucl. Instrum. Methods Phys. Res. B 55, 35 (1991).
51. D. A. Toy, Semicond. Int. 12, 30 (1989).
52. B. Busselman, T. Emery, K. Staker, K. Heiman, D. Tran, M. Elzingre, and R. Markle, IEEE/SEMI Int. Semicond. Manuf. Sci. Symp. 93CH3280-5, 20 (1993).
53. H. Pham, M. Elzingre, and P. Borden, Semicond. Int. 18, 101 (1995).