Observation and evaluation of flaked particle behavior in magnetically enhanced reactive ion etching equipment using a dipole ring magnet

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 4, 2004, Pages 1688-1693

  Moriya, Tsuyoshi ^a   Nagaike, Hiroshi ^a   Denpoh, Kazuki ^a   Morimoto, Tamotsu ^a   Aomori, Masaru ^a   Kawaguchi, Shinichi ^a   Shimada, Manabu ^b   Okuyama, Kikuo ^b  

^a TOKYO ELECTRON LTD   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; DEPOSITION; ELECTRON MOBILITY; ELECTROSTATICS; FILM GROWTH; LIGHT SCATTERING; LSI CIRCUITS; MAGNETIC FIELD EFFECTS; MAGNETS; MONITORING; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE;

DIPOLE RING MAGNETS; MAGNETIZED PLASMAS; PARTICLE MONITORING SYSTEMS; PLASMA OXIDE ETCHING;

ELEMENTARY PARTICLES;

EID: 4944220758     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1763592     Document Type: Article

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