Densification and properties of fluorine doped tin oxide (FTO) ceramics by spark plasma sintering

Ceramic Transactions

Volumn 246, Issue , 2014, Pages 59-64

  Li, Meijuan ^a,b   Xiang, Kun ^a   Shen, Qiang ^a   Zhang, Lianmeng ^a  

^a WUHAN UNIVERSITY OF TECHNOLOGY   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC MATERIALS; CONDUCTIVE MATERIALS; DEPOSITION; ENVIRONMENTAL TECHNOLOGY; FILM PREPARATION; FLUORINE COMPOUNDS; GLASS; GRAIN GROWTH; HALL MOBILITY; NANOCOMPOSITES; SEMICONDUCTOR DOPING; SPARK PLASMA SINTERING;

FLUORINE CONCENTRATIONS; FLUORINE DOPED TIN OXIDE; PULSE LASER DEPOSITION; RELATIVE DENSITY; SCANNING ELECTRONIC MICROSCOPES; TARGET MATERIALS; THEORETICAL DENSITY; TRANSPARENT CONDUCTIVE MATERIALS;

TIN OXIDES;

EID: 84897928978     PISSN: 10421122     EISSN: None     Source Type: Book Series    
DOI: 10.1002/9781118771327.ch6     Document Type: Conference Paper

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