SnO2: F thin films deposited by RF magnetron sputtering: Effect of the snF2 amount in the target on the physical properties

Revista Mexicana de Fisica

Volumn 59, Issue 4, 2013, Pages 335-338

  de Moure Flores, F ^a   Guillen Cervantes A ^b   Nieto Zepeda, K E ^b   Quinones Galvan J G ^b   Hernandez Hernandez A ^b   de la L Olvera, M ^b   Melendez Lira M ^b  

^a Universidad Autíonoma de Querétaro   (Mexico)

^b DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

F doped tin oxide; RF magnetron sputtering; Transparent conducting oxide; Transparent electrodes

Indexed keywords

EID: 84878429753     PISSN: 0035001X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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