Comparison of transparent conductive indium tin oxide, titanium-doped indium oxide, and fluorine-doped tin oxide films for dye-sensitized solar cell application

Journal of Electrical Engineering and Technology

Volumn 6, Issue 5, 2011, Pages 684-687

  Kwak, Dong Joo ^a   Moon, Byung Ho ^a   Lee, Don Kyu ^b   Park, Cha Soo ^c   Sung, Youl Moon ^a  

^a Kyungsung University   (South Korea)

^b Dong Eui University   (South Korea)

^c Dong eui Institute of Technology   (South Korea)

Author keywords

Dye sensitized solar cell; RF magnetron sputtering; Titanium doped indium oxide; Transparent conductive oxide

Indexed keywords

AFM; AFTER-HEAT TREATMENT; COMMERCIAL PRODUCTS; DYE SENSITIZATION; DYE-SENSITIZED SOLAR CELL; DYE-SENSITIZED SOLAR CELLS; ELECTRICAL RESISTIVITY; FLUORINE DOPED TIN OXIDE; FLUORINE-DOPED TIN OXIDE FILMS; INDIUM TIN OXIDE; LIGHT INTENSITY; NEAR INFRARED; PHOTOCONVERSION EFFICIENCY; PHOTOVOLTAIC PERFORMANCE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; SODA LIME GLASS SUBSTRATE; TITANIUM-DOPED INDIUM OXIDE; TRANSPARENT CONDUCTIVE; TRANSPARENT CONDUCTIVE OXIDES;

CONDUCTIVE FILMS; ELECTRIC CONDUCTIVITY; INDIUM; INDIUM COMPOUNDS; INFRARED RADIATION; MAGNETRON SPUTTERING; NANOCOMPOSITES; PHOTOELECTROCHEMICAL CELLS; SOLAR CELLS; SUBSTRATES; TIN; TIN OXIDES; TITANIUM; TITANIUM OXIDES; X RAY DIFFRACTION;

OXIDE FILMS;

EID: 84863239806     PISSN: 19750102     EISSN: None     Source Type: Journal    
DOI: 10.5370/JEET.2011.6.5.684     Document Type: Article

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