Scale-up of a chemo-epitaxy flow for feature multiplication using directed self- assembly of block-copolymers

Journal of Photopolymer Science and Technology

Volumn 26, Issue 6, 2013, Pages 831-839

  Rincon Delgadillo, Paulina ^a,b,c   Craig, Gordon ^a   Gronheid, Roel ^b   Nealey, Paul F ^a  

^a UNIVERSITY OF CHICAGO   (United States)

^b IMEC   (Belgium)

^c UNIVERSITY OF LEUVEN   (Belgium)

Author keywords

Chemo epitaxy; Directed self assembly; Implementation

Indexed keywords

EID: 84893489366     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.26.831     Document Type: Review

References (20)

1. Liu, C.-C., et al., "The integration of block copolymer directed assembly with 193 immersion lithography". Journal of Vacuum Science & Technology B, 28(6) (2010) C6B30-C6B34.
2. Ruiz, R., et al., "Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly". Science, 321 (2008) 936-939.
3. Hinsberg, W., et al., "Self-assembling materials for lithographic patterning: overview, status, and moving forward", Proceedings of SPIE-The International Society for Optical Engineering, 7637 (2010) 76370G-76370G.
4. Cheng, J.Y., et al., "Dense self-assembly on sparse chemical patterns: Rectifying and multiplying lithographic patterns using block copolymers". Advanced Materials, 20(16) (2008) 3155-3158.
5. International Technology Roadmap for Semiconductors-Lithography. International Technology Roadmap for Semiconductors, 2011.
6. Bencher, C., et al., "Self-Assembly Patterning for sub-15nm Half-Pitch", A Transition from Lab to Fab. 2011, Proceedings of SPIE. 2011
7. Rincon Delgadillo, P., et al., "Defect source analysis of directed self-assembly process (DSA of DSA)". Proc. of SPIE., 2013 86800L-5.
8. Bencher, C., "Directed self-assembly defectivity assesment", J. Zhou, et al., Editors, Proc. SPIE. 2012, 83230N-1.
9. Edwards, E.W., et al., "Mechanism and kinetics of ordering in diblock copolymer thin films on chemically nanopatterned substrates", Journal of Polymer Science Part B-Polymer Physics, 43(23) (2005) 3444-3459.
10. Edwards, E.W., et al., "Precise control over molecular dimensions of block-copolymer domains using the interfacial energy of chemically nanopatterned substrates", Advanced Materials, 16(15) (2004) 1315-1319.
11. Welander, A.M., et al., "Rapid directed assembly of block copolymer films at elevated temperatures", Macromolecules, 41(8) (2008), 2759-2761.
12. Liu, C.C., et al., "Chemical Patterns for Directed Self-Assembly of Lamellae-Forming Block Copolymers with Density Multiplication of Features", Macromolecules, 46(4) (2013) 1415-1424.
13. Detcheverry, F.A., et al., "Interpolation in the Directed Assembly of Block Copolymers on Nanopatterned Substrates: Simulation and Experiments", Macromolecules, 43(7) (2010) 3446-3454.
14. Liu, C.C., et al., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats", Macromolecules, 44(7) (2011) 1876-1885.
15. Liu, C.-C., et al., "Fabrication of Lithographically Defined Chemically Patterned Polymer Brushes and Mats", Macromolecules, 44(7):(2011) 1876-1885.
16. Liu, C.-C., et al., "Towards an all-track 300mm process for directed self-assembly", J. Vac. Sci. Technol. B. 2011
17. Rincon Delgadillo, P.A., et al., "Implementation of a chemo-epitaxy flow for directed self-assembly on 300mm wafer processing equipment", Journal of Micro/Nanolithography, MEMS, and MOEMS, 2012 031302-1:031302-5.
18. Delgadillo, P.A.R., et al., "Geometric Control of Chemically Nano-patterned Substrates for Feature Multiplication Using Directed Self-Assembly of Block Copolymers", Journal of Photopolymer Science and Technology, 25(1) (2012) 77-81.
19. Rincon Delgadillo, P.A., et al., "Process sensitivities in exemplary chemo-epitaxy directed self-assembly integration", Proc. SPIE, 8680 (2013) 86801H.
20. Rincon Delgadillo, P.A., et al., "All track directed self-assembly of block copolymers: process flow and origin of defects", Proceedings SPIE 8323 (2012) 83230D.