Photoresist-free patterning by mechanical abrasion of water-soluble lift-off resists and bare substrates: Toward green fabrication of transparent electrodes

PLoS ONE

Volumn 8, Issue 12, 2013, Pages

  Printz, Adam D ^a   Chan, Esther ^a   Liong, Celine ^a   Martinez, René S ^a   Lipomi, Darren J ^a  

^a UNIVERSITY OF CALIFORNIA SAN DIEGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANION; COPPER; INDIUM TIN OXIDE; NICKEL; POLY(3,4 ETHYLENEDIOXYTHIOPHENE); POLY(STYRSTYRENESULFONATE); POLYMER; POLYSTYRENESULFONIC ACID; THIOPHENE DERIVATIVE; UNCLASSIFIED DRUG; WATER;

ABRASION LITHOGRAPHY; ARTICLE; CHEMICAL PROCEDURES; CHEMICAL REACTION; DISSOLUTION; ELECTRODE; ELECTRONICS; ENVIRONMENTAL IMPACT; FILM; GREEN CHEMISTRY; IMMERSION; LABORATORY DEVICE; MICROTECHNOLOGY; ORGANIC CHEMISTRY; PHYSICAL PARAMETERS; SCRATCHING;

ELECTRODES;

EID: 84892907435     PISSN: None     EISSN: 19326203     Source Type: Journal    
DOI: 10.1371/journal.pone.0083939     Document Type: Article

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