Ordered phases of reduced ceria as epitaxial films on Cu(111)

Journal of Physical Chemistry C

Volumn 118, Issue 1, 2014, Pages 357-365

  Duchoň, Tomáš ^a   Dvořák, Filip ^a   Aulická, Marie ^a   Stetsovych, Vitalii ^a   Vorokhta, Mykhailo ^a   Mazur, Daniel ^a   Veltruská, Kateřina ^a   Skála, Tomáš ^a   Mysliveček, Josef ^a   Matolínová, Iva ^a   Matolín, Vladimír ^a  

^a CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED MODELING; BULK TERMINATION; INTERFACE REACTIONS; OXYGEN VACANCY ORDERINGS; REDUCIBLE OXIDES; SPECIAL PROPERTIES; THIN EPITAXIAL FILMS; VACANCY ENGINEERING;

CERIUM; COPPER; EPITAXIAL FILMS; EPITAXIAL GROWTH; OXYGEN VACANCIES; STOICHIOMETRY;

INTERFACES (MATERIALS);

EID: 84892598474     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp409220p     Document Type: Article

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