Influence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy

Journal of Materials Science and Technology

Volumn 29, Issue 12, 2013, Pages 1134-1138

  Liu, Yunyan ^a   Yang, Shanying ^b   Wei, Gongxiang ^a   Pan, Jiaoqing ^c   Yuan, Yuzhen ^a   Cheng, Chuanfu ^d  

^a SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

^b Laiwu Vocational and Technical College   (China)

^c INSTITUTE OF SEMICONDUCTORS   (China)

^d SHANDONG NORMAL UNIVERSITY   (China)

Author keywords

Laser molecular beam epitaxy (LMBE); Morphology; Stress; Thin films; ZnO

Indexed keywords

AUTOCORRELATION LENGTH; DIFFERENT SUBSTRATES; LASER-MOLECULAR BEAM EPITAXY (LMBE); MORPHOLOGY EVOLUTION; ROOT MEAN SQUARE ROUGHNESS; SUBSTRATE TEMPERATURE; SURFACE FLUCTUATIONS; ZNO;

ATOMIC FORCE MICROSCOPY; AUTOCORRELATION; EPITAXIAL GROWTH; MORPHOLOGY; SAPPHIRE; STRESSES; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION;

MOLECULAR BEAM EPITAXY;

EID: 84890114884     PISSN: 10050302     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jmst.2013.10.005     Document Type: Article

References (27)

1. Pearton S., Heo W., Ivill M., Norton D. Semicond. Sci. Technol. 2004, 19:R59-R74.
2. Liu C., Yun F., Morkoc H. J.Mater. Sci. 2005, 16:555-597.
3. Roy V.A.L., Djurišić A.B., Liu H., Zhang X.X., Leung Y.H., Xie M.H., Gao J., Lui H.F., Surya C. Appl. Phys. Lett. 2004, 84:756-758.
4. Prellier W., Fouchet A., Mercey B. J.Phys. Condens. Matter 2003, 15:R1583-R1601.
5. Yang H.N., Zhao Y.P., Wang G.C., Lu T.M. Phys. Rev. Lett. 1996, 76:3774-3777.
6. Ravikumar P., Ravichandran K., Sakthivel B. J.Mater. Sci. Technol. 2012, 28:999-1003.
7. Triboulet R., Perrière J. Prog. Cryst. Growth Charact. Mater. 2003, 47:65-138.
8. Rahman M., Khan M.K.R., Islam M.R., Halim M.A., Shahjahan M., Hakim M.A., Saha D.K., Khan J.U. J.Mater. Sci. Technol. 2012, 28:329-335.
9. Yang H.N., Wang G.C., Lu T.M. Diffraction from Rough Surfaces and Dynamic Growth Fronts 1993, World Scientific Publishers, Singapore.
10. Kumari V., Kumar V., Mohan D., Purnima, Malik B.P., Mehra R.M. J.Mater. Sci. Technol. 2012, 28:506-511.
11. Zhang D., Wang C.Z., Liu Y.L., Shi Q., Wang W.J. Opt. Laser Technol. 2012, 44:1136-1140.
12. Yang S.Y., Man B.Y., Liu M., Chen C.S., Gao X.G., Wang C.C., Hu B. Physica B 2010, 405:4027-4031.
13. Dinia A., Ayoub J.P., Schmerber G. Phys. Lett. A 2004, 333:152-156.
14. Wang Z.L., Li X.L., Jiang F.X., Tian B.Q., Lü B.H., Xu H.H. Rare. Metal. Mat. Eng. 2008, 37:831-834.
15. Chen M., Pei Z.L., Sun C., Wen L.S., Wang X. J.Cryst. Growth 2000, 220:254-262.
16. Mollwo E. Landoldt - börnstein. Zahlenwerte und funktionen aus Naturwiss. u.Technik. Neue Serie 1982, 35. Springer, Berlin.
17. Cebulla R., Wendt R., Ellmer K. J.Appl. Phys. 1998, 83:1087-1096.
18. Maniv S., Westwood W.D., Colombini E. J.Vac. Sci. Technol. 1982, 20:162-170.
19. Lee H.W., Lau S.P., Wang Y.G., Tay B.K., Hng H.H. Thin Solid Films 2004, 458:15-19.
20. Kumar R., Khare N., Kumar V., Bhalla G.L. Appl. Surf. Sci. 2008, 254:6509-6513.
21. Wei X.Q., Huang J.Z., Zhang M.Y., Du Y., Man B.Y. Mater. Sci. Eng. B 2010, 166:141-146.
22. Zou J., Zhou S.M., Xia C.T., Hang Y., Xua J., Gu S.L., Zhang R. J.Cryst. Growth 2005, 280:185-190.
23. Liu Y.Y., Cheng C.F., Yang S.Y., Song H.S., Wei G.X., Xue C.S., Wang Y.Z. Thin Solid Films 2011, 519:5444-5449.
24. Oliveira T.J., Aarão Reis F.D.A. Phys. Rev. E 2011, 83:041608.
25. Oliveira T.J., Aarão Reis F.D.A. J.Appl. Phys. 2007, 101:063507.
26. Ebothé J., Hichou A.E., Vautrot P., Addou M. J.Appl. Phys. 2003, 93:632-641.
27. Shen Q., Blakely J.M., Bedzyk M.J., Finkelstein K.D. Phys. Rev. B 1989, 40:3480-3482.