Roughness evolution in Ga doped ZnO films deposited by pulsed laser deposition

Thin Solid Films

Volumn 519, Issue 16, 2011, Pages 5444-5449

  Liu, Yun Yan ^a,b   Cheng, Chuan Fu ^a   Yang, Shan Ying ^a   Song, Hong Sheng ^c   Wei, Gong Xiang ^b   Xue, Cheng Shan ^a   Wang, Yong Zai ^b  

^a SHANDONG NORMAL UNIVERSITY   (China)

^b SHANDONG UNIVERSITY OF TECHNOLOGY   (China)

^c SHANDONG JIANZHU UNIVERSITY   (China)

Author keywords

Atomic force microscopy; Fractals; Ga doped ZnO; Morphology; Pulsed laser deposition; Surface roughness

Indexed keywords

ATOMIC FORCE MICROSCOPES; DEPOSITION TIME; FRACTAL CHARACTERISTICS; GA DOPED ZNO; GROWTH EXPONENT; GROWTH TIME; HEIGHT-HEIGHT CORRELATION FUNCTIONS; IMAGE DATA; INITIAL STAGES; LASER DEPOSITIONS; LATERAL CORRELATION LENGTH; LATERAL STRAIN; MORPHOLOGY EVOLUTION; POWER-LAW FUNCTIONS; QUARTZ SUBSTRATE; RANDOM FLUCTUATION; ROUGHNESS EVOLUTION; ROUGHNESS EXPONENT; SELF-AFFINE FRACTAL MODELS;

ATOMIC FORCE MICROSCOPY; DEPOSITION; FRACTALS; GALLIUM; GALLIUM ALLOYS; MORPHOLOGY; PULSED LASER DEPOSITION; QUARTZ; SUBSTRATES; SURFACE MORPHOLOGY; SURFACE ROUGHNESS; ZINC OXIDE;

PULSED LASERS;

EID: 79957989326     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.02.056     Document Type: Article

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