Lithography-free approach to highly efficient, scalable SERS substrates based on disordered clusters of disc-on-pillar structures

Nanotechnology

Volumn 24, Issue 50, 2013, Pages

  Agapov, Rebecca L ^a   Srijanto, Bernadeta ^a,b   Fowler, Chris ^a   Briggs, Dayrl ^a   Lavrik, Nickolay V ^a   Sepaniak, Michael J ^c  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b University of Tennessee   (United States)

^c UNIVERSITY OF TENNESSEE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC REACTIVE ION ETCHING; CIRCULAR PATTERN; COMPUTATIONAL ANALYSIS; LARGE-AREA SUBSTRATES; OPTIMIZED PARAMETER; SURFACE ENHANCED RAMAN SPECTROSCOPY; THIN-FILM DEPOSITIONS; VERTICALLY ALIGNED;

STOCHASTIC SYSTEMS;

SUBSTRATES;

EID: 84889673045     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/24/50/505302     Document Type: Article

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