Sub-10 nm structures on silicon by thermal dewetting of platinum

Nanotechnology

Volumn 21, Issue 50, 2010, Pages

  Strobel, Sebastian ^a   Kirkendall, Christopher ^a,b   Chang, Jae Byum ^a   Berggren, Karl K ^a  

^a Department of Electrical Engineering and Computer Science   (United States)

^b University of Missouri   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALED FILMS; ANNEALING TIME; DE-WETTING; DROPLET FORMATION; FILM MORPHOLOGY; INTERMEDIATE NETWORKS; MEAN DIAMETER; MULTI-LAYERED FILMS; NANOPILLARS; PHYSICAL PROCESS; PLATINUM FILMS; SEM; SILICON SUBSTRATES; THERMAL DEWETTING; VIA HOLE;

ANNEALING; DROP FORMATION; MORPHOLOGY; NANOWIRES; PLATINUM; SCANNING ELECTRON MICROSCOPY; SILICIDES;

REACTIVE ION ETCHING;

EID: 78650161433     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/50/505301     Document Type: Article

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