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Japanese Journal of Applied Physics

Volumn 52, Issue 11 PART 2, 2013, Pages

Plasma diagnostics and characterizations of Al-doped ZnO films deposited with low temperature sputtering process

(4) Choi, Yoon S a Shim, Byeong C a Kim, Hye R a Han, Jeon G a

a Sungkyunkwan University (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO FILMS; CONVENTIONAL MAGNETRON SPUTTERING; FACING TARGETS SPUTTERING; HIGH-ENERGY PARTICLES; ION CURRENT DENSITY; LOW- TEMPERATURE PROCESS; MAGNETRON SPUTTERING SYSTEMS; SPUTTERING PROCESS;

ALUMINUM; EMISSION SPECTROSCOPY; PLASMA DIAGNOSTICS; TEMPERATURE; ZINC;

QUALITY CONTROL;

EID: 84888991149 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.7567/JJAP.52.11NB02 Document Type: Conference Paper

Times cited : (7)

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