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Volumn 103, Issue 22, 2013, Pages

Atomistic full-band simulations of monolayer MoS2 transistors

Author keywords

[No Author keywords available]

Indexed keywords

DRAIN-INDUCED BARRIER LOWERING; GATE-INDUCED DRAIN LEAKAGE; METAL OXIDE SEMICONDUCTOR FIELD-EFFECT TRANSISTORS; NEGATIVE DIFFERENTIAL RESISTANCES; OUTPUT CHARACTERISTICS; QUANTUM TRANSPORT SIMULATIONS; SUBTHRESHOLD SLOPE; TIGHT-BINDING HAMILTONIANS;

EID: 84888618939     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.4837455     Document Type: Article
Times cited : (54)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.