SCOPUS 정보 검색 플랫폼

Volumn 114, Issue 17, 2013, Pages

Radio frequency plasma power dependence of the moisture permeation barrier characteristics of Al2O3 films deposited by remote plasma atomic layer deposition

(5) Jung, Hyunsoo a,b Choi, Hagyoung a Jeon, Heeyoung a Lee, Sanghun a Jeon, Hyeongtag a

a Hanyang University (South Korea)

b Samsung Display Co (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; MOISTURE PERMEATION; PLASMA DIAGNOSIS; POLYETHERSULFONES; RADIO FREQUENCY PLASMA; REMOTE PLASMA ATOMIC LAYER DEPOSITIONS; TRIMETHYLALUMINUM; WATER VAPOR TRANSMISSION RATE;

ALUMINUM; ATOMIC LAYER DEPOSITION; DEPOSITION; ELECTRIC PROPERTIES; IONS; MOISTURE; PLASMAS;

GAS PERMEABLE MEMBRANES;

EID: 84888422021 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.4829031 Document Type: Article

Times cited : (13)

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