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Volumn 31, Issue 6, 2013, Pages

In-situ plasma cleaning of samples to remove hydrocarbon and/or polydimethylsiloxane prior to ToF-SIMS analysis

Author keywords

[No Author keywords available]

Indexed keywords

ACCURATE ANALYSIS; ADSORBED LAYERS; PLASMA CLEANING; POLYDIMETHYLSILOXANE PDMS; REMOTE PLASMAS; SURFACE CONTAMINANTS; TIME-OF-FLIGHT SECONDARY ION MASS SPECTROSCOPY; TOF-SIMS ANALYSIS;

EID: 84887916340     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4822516     Document Type: Article
Times cited : (7)

References (27)
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    • (1988) AIP Conf. Proc. , vol.171 , pp. 144
    • Dylla, H.F.1
  • 15
    • 84887885486 scopus 로고    scopus 로고
    • See: http://www.evactron.com/.
  • 16
    • 84887928066 scopus 로고    scopus 로고
    • See: http://www.iontof.com/.
  • 17
    • 58149477470 scopus 로고    scopus 로고
    • Mini-Course on Plasma Diagnostics, IEEE-ICOPS Meeting, Jeju, Korea, June 5
    • F. F. Chen, " Lecture notes on Langmuir probe diagnostics. " in Mini-Course on Plasma Diagnostics, IEEE-ICOPS Meeting, Jeju, Korea, June 5, 2003. See: http://www.seas.ucla.edu/~ffchen/Publs/Chen210R.pdf.
    • (2003) Lecture Notes on Langmuir Probe Diagnostics
    • Chen, F.F.1
  • 18
    • 13844312554 scopus 로고    scopus 로고
    • R. K. Janev, D. Reiter, and U. Samm (Forschungszentrum, Zentralbibliothek), available at
    • Collision Processes in Low-temperature Hydrogen Plasma, edited by, R. K. Janev, D. Reiter, and, U. Samm, (Forschungszentrum, Zentralbibliothek, 2003), available at http://www.eirene.de/report-4105.pdf.
    • (2003) Collision Processes in Low-temperature Hydrogen Plasma
  • 19
    • 0003808207 scopus 로고
    • Springer Series on Atoms and Plasmas Volume, edited by R. K. Janev, W. D. Langer, D. E. Post, Jr., and K. Evans, Jr. (Springer-Verlag, Berlin)
    • Elementary Processes in Hydrogen-Helium Plasmas: Cross Sections and Reaction Rate Coefficients, Springer Series on Atoms and Plasmas Volume 4, edited by, R. K. Janev, W. D. Langer, D. E. Post, Jr., and, K. Evans, Jr., (Springer-Verlag, Berlin, 1987).
    • (1987) Elementary Processes in Hydrogen-Helium Plasmas: Cross Sections and Reaction Rate Coefficients , vol.4
  • 21
    • 84887866217 scopus 로고    scopus 로고
    • SPIE, 2013 Advanced Lithography, 24-28 Feb. Technical Summaries, San Jose, CA, Paper 8679-115, Session PS1. See
    • 2 plasma cleaning for EUV applications.," in SPIE, 2013 Advanced Lithography, 24-28 Feb. 2013 Technical Summaries, San Jose, CA, Paper 8679-115, Session PS1. See: http://spie.org/Documents/ConferencesExhibitions/AL13-Abstracts.pdf.
    • (2013) 2 Plasma Cleaning for EUV Applications
    • Kosmowska, E.1    Varley, D.2    Vane, R.3    Moore, C.4
  • 22
    • 84887897706 scopus 로고    scopus 로고
    • E-JVTAD6-31-336306 for the measured values in Tables I and II
    • See supplementary material at http://dx.doi.org/10.1116/1.4822516 E-JVTAD6-31-336306 for the measured values in Tables I and II.
  • 26
    • 33645593133 scopus 로고    scopus 로고
    • John C. Vickerman and David Briggs (Surface Spectra/IMPublications, UK)
    • D. Fraser Reich, in ToF-SIMS, Surface Analysis by Mass Spectrometry, edited by, John C. Vickerman, and, David Briggs, (Surface Spectra/ IMPublications, UK, 2001), p. 113.
    • (2001) ToF-SIMS, Surface Analysis by Mass Spectrometry , pp. 113
    • Fraser Reich, D.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.