Poly-dimethyl-siloxane (PDMS) contamination of polystyrene (PS) oligomers samples: A comparison of time-of-flight static secondary ion mass spectrometry (TOF-SSIMS) and X-ray photoelectron spectroscopy (XPS) results

Applied Surface Science

Volumn 227, Issue 1-4, 2004, Pages 318-324

  Oran, U ^a   Unveren E ^a   Wirth, T ^a   Unger, W E S ^a  

^a BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

Author keywords

PDMS; Polystyrene; Segregation; TOF SIMS

Indexed keywords

CONTAMINATION; OLIGOMERS; PARAFFINS; SECONDARY ION MASS SPECTROMETRY; SENSITIVITY ANALYSIS; SEPARATION; SILICON WAFERS; SURFACE REACTIONS; ULTRASONIC WAVES; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYDIMETHYL SILOXANES (PDMS); TIME OF FLIGH STATIC SECONDARY ION MASS SPECTROMETRY (TOF-SSIMS);

POLYSTYRENES;

EID: 1842581540     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.12.008     Document Type: Article

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