Cluster ion beam process technology

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 820-829

  Yamada, Isao ^a   Matsuo, Jiro ^b   Toyoda, Noriaki ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Gas cluster ion beam processing; Ion implantation; Smoothing; Sputtering; Thin film formation

Indexed keywords

ION BOMBARDMENT; ION IMPLANTATION; MONOMERS; SPUTTERING; THIN FILMS;

GAS CLUSTER ION BEAM PROCESSING;

ION BEAMS;

EID: 0038412823     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00857-7     Document Type: Conference Paper

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