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Volumn 1, Issue 47, 2013, Pages 7941-7951

Self-assembly of polystyrene-block-poly(4-vinylpyridine) block copolymer on molecularly functionalized silicon substrates: Fabrication of inorganic nanostructured etchmask for lithographic use

(10) Cummins, C a,b Borah, D a,b,c Rasappa, S a,b,c Chaudhari, A a,b,c Ghoshal, T a,b,c O'Driscoll, B M D a,b Carolan, P a,b Petkov, N a,b Holmes, J D a,b,c Morris, M A a,b,c

a UNIVERSITY COLLEGE CORK (Ireland)

b UNIVERSITY COLLEGE CORK (Ireland)

c TRINITY COLLEGE DUBLIN (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

COMPLEMENTARY TECHNIQUES; LARGE SURFACE AREA; ORDERED NANOSTRUCTURES; SELF ASSEMBLY PROCESS; SEMICONDUCTOR INDUSTRY; SILICON NANOPILLARS; SILICON SUBSTRATES; UNCONVENTIONAL APPROACHES;

ASPECT RATIO; ETHYLENE GLYCOL; LITHOGRAPHY; NANOSTRUCTURES; POLYSTYRENES; SELF ASSEMBLY; SEMICONDUCTOR DEVICE MANUFACTURE;

BLOCK COPOLYMERS;

EID: 84887902210 PISSN: 20507534 EISSN: 20507526 Source Type: Journal
DOI: 10.1039/c3tc31498g Document Type: Article

Times cited : (35)

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