On the influence of dc electric fields on the aerosol assisted chemical vapor deposition growth of photoactive titanium dioxide thin films

Langmuir

Volumn 29, Issue 44, 2013, Pages 13542-13550

  Romero, Luz ^a   Binions, Russell ^a  

^a QUEEN MARY UNIVERSITY OF LONDON   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AEROSOL-ASSISTED CHEMICAL VAPOR DEPOSITIONS; CRYSTALLOGRAPHIC ORIENTATIONS; FILM MICROSTRUCTURES; FLUORINE DOPED TIN OXIDE; PHOTOCATALYTIC ACTIVITIES; POTENTIAL DIFFERENCE; TITANIUM DIOXIDE THIN FILM; TITANIUM ISOPROPOXIDE;

AEROSOLS; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; DEPOSITION; GLASS; OXIDES; PHOTOCATALYSIS; SCANNING ELECTRON MICROSCOPY; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE; ULTRAVIOLET VISIBLE SPECTROSCOPY; VAPORS; X RAY DIFFRACTION;

ELECTRIC FIELDS;

EID: 84887602600     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la403070b     Document Type: Article

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