Effect of TiO 2 thin film thickness and specific surface area by low-pressure metal-organic chemical vapor deposition on photocatalytic activities

Applied Catalysis B: Environmental

Volumn 55, Issue 4, 2005, Pages 253-257

  Jung, Sang Chul ^a   Kim, Sun Jae ^b   Imaishi, Nobuyuki ^c   Cho, Yong Ick ^d  

^a Sunchon National University   (South Korea)

^b Sejong University   (South Korea)

^c KYUSHU UNIVERSITY   (Japan)

^d Korea Photonics Technology Institute (KOPTI)   (South Korea)

Author keywords

Film thickness; Low pressure metal organic chemical vapor deposition; Photocatalytic activity; Specific surface area; TiO 2 thin film

Indexed keywords

DEPOSITION TIME; FILM THICKNESS; KOLMOGOROV MODEL; LOW-PRESSURE METAL-ORGANIC CHEMICAL VAPOR DEPOSITION (LPMOCVD);

CRYSTAL ORIENTATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PHOTOCATALYSIS; SUBSTRATES; THIN FILMS;

TITANIUM DIOXIDE;

EID: 11844254487     PISSN: 09263373     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apcatb.2004.08.009     Document Type: Article

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