Comparison of different GaN etching techniques

2006 International Conference on Compound Semiconductor Manufacturing Technology

Volumn , Issue , 2006, Pages 105-108

  Ma, Lei ^a   Adeni, K Fareen ^a   Zeng, Chang ^a   Jin, Yawei ^a   Dandu, Krishnanshu ^a   Saripalli, Yoganand ^a   Johnson, Mark ^a   Barlage, Doug ^a  

^a North Carolina State University   (United States)

Author keywords

AFM; Binary etching; GaN; Nitride; Profilometer

Indexed keywords

AFM; ETCHING TECHNIQUE; GAN; GAN FILM; N-TYPE GAN; P-TYPE GAN; PROFILOMETERS; ROOM TEMPERATURE;

EXPERIMENTS; NITRIDES; PROFILOMETRY; SEMICONDUCTOR DEVICE MANUFACTURE;

GALLIUM NITRIDE;

EID: 84887473426     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (12)

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