Depth profiling organic/inorganic interfaces by argon gas cluster ion beams: Sputter yield data for biomaterials, in-vitro diagnostic and implant applications

Surface and Interface Analysis

Volumn 45, Issue 13, 2013, Pages 1859-1868

  Cumpson, Peter J ^a   Portoles, Jose F ^a   Barlow, Anders J ^a   Sano, Naoko ^a   Birch, Mark ^b  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

^b NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

cluster ion; GCIB; SIMS; sputter yield; sputtering; XPS

Indexed keywords

CLUSTER IONS; GCIB; IN-DEPTH PROFILING; IN-VITRO DIAGNOSTIC; INORGANIC MATERIALS; ORGANIC/INORGANIC INTERFACES; SEMIEMPIRICAL EQUATION; SPUTTER YIELDS;

ARGON; BIOLOGICAL MATERIALS; BOROSILICATE GLASS; DEPTH PROFILING; IMPLANTS (SURGICAL); ION BEAM ASSISTED DEPOSITION; IONS; POLYMETHYL METHACRYLATES; QUARTZ; SECONDARY ION MASS SPECTROMETRY; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY;

PHASE INTERFACES;

EID: 84887317182     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.5333     Document Type: Article

References (27)

1. A. Delcorte, B. J. Garrison, K. Hamraoui, Dynamics of molecular impacts on soft materials: From fullerenes to organic nanodrops, Anal. Chem. 2009, 81, 6676-6686.
2. C. Anders, H. M. Urbassek, R. E. Johnson, Linearity and additivity in cluster-induced sputtering: A molecular dynamics study of Van der Waals bonded systems, Phys. Rev. B 2004, 70, 155404.
3. T. Seki, T. Murase, J. Matsuo, Cluster size dependence of sputtering yield by cluster ion beam irradiation, Nucl. Instrum. Meth. Phys. Res. B 2006, 242, 179-181.
4. M. P. Gispert, A. P. Serro, R. Colaco, B. Sramago, Bovine serum albumin adsorption onto 316L stainless steel and alumina a comparative study using depletion, protein radiolabeling, quartz crystal microbalance and atomic force microscopy, Surf. Interface Anal. 2008, 40, 1529-1537.
5. V. Payet, S. Brunner, A. Galtayries, I. Frateur, P. Marcus, Cleaning of albumin-contaminated Ti and Cr surfaces: an XPS and QCM study, Surf. Interface Anal. 2008, 40, 215-219.
6. P. J. Cumpson, J. F. Portoles, A. J. Barlow, N. Sano, Accurate Argon Cluster-Ion Sputter Yields; Measured Yields and Effect of the Sputter Threshold in Practical Depth-Profiling by XPS and SIMS, J. Appl. Phys. 2013, 114, 124313.
7. C. M. Mahoney, Cluster secondary-ion mass-spectrometry of polymers and related materials, Mass Spectrom. Rev., 2010, 29, 247-293.
8. P. J. Cumpson, Angle-resolved XPS and AES: Depth-resolution limits and a general comparison of properties of depth-profile reconstruction methods, J. Electron Spectros. Relat. Phenom. 1995, 73, 25-52.
9. S. Tougaard, C. Jansson, Background correction in XPS: Comparison of validity of different methods, Surf. Interface Anal. 1992, 19, 171-174.
10. D. McKeown, new method for measuring sputtering in the region near threshold, Rev. Sci. Instrum. 1961, 32, 133-136.
11. G. Sauerbrey, Verwendung von Schwingquarzen zur Wägung dünner Schichten und zur Mikrowägung, Z. Angew. Phys. 1959, 155, 206-222.
12. P. Schmutz, N.-C. Quach-Vu, I. Gerbe, Metallic medical implants: Electrochemical characterization of corrosion processes, Electrochem. Soc. Interface 2008, 17, 35-40.
13. R. Q. Frazer, R. T. Byron, P. B. Osborne, K. P. West, PMMA: an essential material in medicine and dentistry, J. Long Term Eff. Med. Implants 2005, 15, 629-39.
14. J. L. Ong, D. C. N. Chan, Hydroxyapatites and their use as coatings in dental implants: A review, Crit. Rev. Biomed. Eng. 2000, 28, 667-707.
15. B. Kundu, C. Soundrapandian, S. K. Nandi, P. Mukherjee, N. Dandapat, S. Roy, B. K. Datta, T. K. Mandal, D. Basu, R. N. Bhattacharya, Development of new localized drug delivery system based on ceftriaxone-sulbactam composite drug impregnated porous hydroxylapatite a systematic approach for in vitro and in vivo animal trial, Pharm. Res. 2010, 27, 1659-76.
16. K. Subramani, R. E. Jung, A. Molenberg, C. H. Hammerle, Biofilm on dental implants a review of the literature, Int. J. Oral Maxillofac. Implants 2009, 24, 616-26.
17. D. M. Brunette, P. Tengvall, M. Textor, P. Thomsen, (eds), Titanium in Medicine: Material Science, Surface Science, Engineering Biological responses and medical applications, Springer, Berlin, 2001.
18. D. Buser, S. T. Chen, H. P. Weber, U. C. Belser, Early implant placement following single-tooth extraction in the esthetic zone: biologic rationale and surgical procedures, Int. J. Periodontics Restorative Dent. 2008, 28, 441-51.
19. P. J. Cumpson, J. F. Portoles, N. Sano, Observations on X-ray enhanced sputter rates in argon cluster ion sputter depth profiling of polymers, Surf. Interface Anal. 2013, 45, 601-604.
20. P. J. Cumpson, J. F. Portoles, N. Sano, Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymers, J. Vac. Sci. Technol. A 2013, 31, 020605.
21. P. J. Cumpson, M. P. Seah, The quartz crystal microbalance; radial/polar dependence of mass sensitivity both on and off the electrodes, Meas. Sci. Technol. 1990, 1, 544-555.
22. P. J. Cumpson, Quartz crystal microbalance: A new design eliminates sensitivity outside the electrodes, often wrongly attributed to the electric fringing field, J. Vac. Sci. Technol. A 1997, 15, 2407.
23. P. J. Cumpson, J. F. Portoles, N. Sano, A. J. Barlow, X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers, J. Vac. Sci. Technol. B 2013, 31, 021208.
24. 60 and Ar cluster ion beams for sputtering, Surf. Interface Anal. 2013, 45, 171-174.
25. K. Ichiki, Study on Size Effect of Cluster Ion Beam Irradiation, PhD Thesis, University of Kyoto, 2012.
26. L. Yang, M. P. Seah, I. S. Gilmore, R. J. H. Morris, M. G. Dowsett, L. Boarino, K. Sparnacci, M. Laus, Depth profiling and melting of nanoparticles in secondary ion mass spectrometry (SIMS), J. Phys. Chem. C 2013, 117, 16042-16052.
27. J. D. Vedder, Simple approximations for the error function and its inverse, Am. J. Phys. 1987, 55, 762.