X-ray enhanced sputter rates in argon cluster ion sputter-depth profiling of polymers

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 31, Issue 2, 2013, Pages

  Cumpson, Peter J ^a   Portoles, Jose F ^a   Sano, Naoko ^a   Barlow, Anders J ^a  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CROSSLINKING; DEPTH PROFILING; PHOTODEGRADATION; RADIATION DAMAGE; SPUTTERING; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

BOND SCISSIONS; EXPERIMENTAL CONDITIONS; GAS CLUSTER ION BEAMS; POLY L LACTIC ACID; POLYMER SURFACES; SPUTTER DEPTH PROFILES; SPUTTER-DEPTH PROFILING; WHITE-LIGHT INTERFEROMETRY;

POLYMERS;

EID: 84875800485     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.4793284     Document Type: Article

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