Material dependence of argon cluster ion sputter yield in polymers: Method and measurements of relative sputter yields for 19 polymers

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 31, Issue 2, 2013, Pages

  Cumpson, Peter J ^a   Portoles, Jose F ^a   Sano, Naoko ^a  

^a NEWCASTLE UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON CLUSTERS; ARGON ION; DEPTH ESTIMATION; MEASUREMENTS OF; POLYATOMIC ION SOURCES; POLYMER COATING; POLYMER ELECTRONICS; POLYMER PHOTOVOLTAIC DEVICE; REFERENCE DATA; SPUTTER RATE; SPUTTER YIELDS; TECHNOLOGICAL SIGNIFICANCE; WHITE-LIGHT INTERFEROMETRY;

BIOLOGICAL MATERIALS; DEPTH PROFILING; ION SOURCES;

POLYMERS;

EID: 84874581961     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.4791669     Document Type: Article

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